導電或共軛高分子薄膜之形成方法
  ‧ 專利名稱
  ‧ 專利證書號
  ‧ 專利權人 國立臺灣大學
  ‧ 專利國家
    (申請日)
日本 (2004/03/25)
  ‧ 發明人 謝國煌, Man-Kit Leung, King-Fu Lin, Wen-Yen Chiu, Wen-Chang Chen, Lee-Yih Wang, Wen-Bin Liau, Chi-An Dai, Wei-Fang Su, Hung-Chun Chang, Hung-Ren Wang, Chao-Hui Kuo, Chi-Shin Lee, Jun-Ming Huang, Cheng-Yuan Shih,
 
技術摘要:
本發明揭示了一種導電或共軛高分子薄膜之形成方法,此形成方法首先於基材上形成一具有複數個酸性團基之樹脂層,藉由樹脂層的局部酸性濃度較高之特性以錯合複數個導電或共軛高分子單體或寡聚物於樹脂層中,並藉由擴散至樹脂層中起始劑以相互聚合樹脂層中之複數個導電或共軛高分子單體或寡聚物,並形成一原位聚合之導電或共軛高分子薄膜。本發明之代表圖如第三圖所示。

The present invention discloses a method by utilizing chemical reaction or specific attractive forces (complexation or hydrogen bonding) for forming self-synthesizing conductive or conjugated polymer film and its application. First of all, at least one photoresist layer with a first functional group and a specific pattern is formed, so that the first functional group can bond a second functional group of a conductive or conjugated polymer unit, whereby a conductive or conjugated polymer film with specific pattern is formed. Furthermore, this invention can be applied for forming emitting films, especially for forming emitting layers of OLED/PLED elements.



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