 技術摘要 / Our Technology： |
本發明揭露一種調整一或多道粒子束狀態之系統,該系統包含多個粒子感測器、一估測單元以及一控制器,其中一或多道粒子束撞擊至一基板。粒子感測器偵測從該基板反彈之該一或多道粒子束,並對應產生一或多個感測器信號。估測單元根據該一或多個感測器信號執行一數値方法,以估測該一或多道粒子束之狀態資訊。控制器根據該一或多道粒子束之估測狀態資訊,調整或修正該一或多道粒子束之狀態。該基板根據一欲寫圖案逐步地依照一次序進行圖案製作。
This invention provides a system capable of adjusting status of one or a plurality of particle beams, the system includes a plurality of particle detectors, an estimating unit and a controller, wherein one or a plurality of particle beams are projected to a substrate. The particle detectors detect the one or the plurality of particle beams reflected from the substrate to generate one or a plurality of detector signals in response thereto. The estimating unit estimates status information of the one or the plurality of particle beams by executing a mathematical method according to the one or the plurality of detector signals. The controller adjusts or corrects status of the one or the plurality of particle beams corresponding to the substrate according to the estimated status information of the one or the plurality of particle beams. The substrate is made pattern progressively in a sequence according to a desired pattern.
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| 專利簡述 / Intellectual Properties： |
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聯繫方式 / Contact： |
| 臺大產學合作總中心 / Center of Industry-Academia Collaboration, NTU |
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| Email：ordiac@ntu.edu.tw |
電話/Tel：02-3366-9945 |
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專利行銷平台