技術摘要 / Our Technology: |
本發明實施例提供一種導電薄膜的製造方法,包含在一基板上,以溶液法形成一第一金屬氧化物層;接著,以非溶液法或溶液法形成一無銦金屬層於第一金屬氧化物層上;接著,以溶液法形成一第二金屬氧化物層於無銦金屬層上。
An embodiment of this invention provides a method to produce a conductive thin film, which comprises: providing a substrate; forming a first metal oxide layer on the substrate; forming an indium-free metal layer on the first metal oxide layer; and forming a second metal oxide layer on the indium-free layer, wherein the first metal oxide layer, the indium-free metal layer, and the second oxide layer are all solution processed.
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專利簡述 / Intellectual Properties: |
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聯繫方式 / Contact: |
臺大產學合作總中心 / Center of Industry-Academia Collaboration, NTU |
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Email:ordiac@ntu.edu.tw |
電話/Tel:02-3366-9945 |
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