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 可調變奈米結構之週期、形狀及尺寸之新微影技術(技術方法)
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刊登日期：2014/05/21 |
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| ‧ 專利名稱 |
可調變奈米結構之週期、形狀及尺寸之新微影技術(技術方法) |
| ‧ 專利證書號 |
8748061
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| ‧ 專利權人 |
國立臺灣大學 |
‧ 專利國家
(申請日) |
美國 (2012/03/19)
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| ‧ 發明人/PI |
李嗣涔,莊方慈,江昱維,
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| ‧ 單位 |
電機工程學系
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| ‧ 簡歷/Experience |
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| 技術摘要 / Our Technology： |
A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface and a lower surface, applying a stable force to the elastomeric transparent substrate for deforming the elastomeric transparent substrate, forming a light-penetrable thin film layer on the upper surface of the elastomeric transparent substrate, and removing the force applying to the elastomeric transparent substrate, whereby the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape and the lower surface of the elastomeric transparent substrate is in a plate shape.
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| 專利簡述 / Intellectual Properties： |
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聯繫方式 / Contact： |
| 臺大產學合作總中心 / Center of Industry-Academia Collaboration, NTU |
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| Email：ordiac@ntu.edu.tw |
電話/Tel：02-3366-9945 |
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