 技術摘要 / Our Technology： |
本發明有關於一種干涉量測裝置，尤指一種低同調光之干涉量測裝置，主要包括有一光源模組、一分光器、一第一透鏡組及一第二透鏡組，其中光源模組所產生的光束會投射於分光器上，並以分光器將光束進行分光，以產生一第一光束及一第二光束，且第一光束及第二光束分別穿透第一透鏡組及第二透鏡組而投射在一反射模組及一待測物上，反射模組及待測物所反射與散射的光束將會在一偵測裝置形成一干涉圖案，藉此將以推算出待測物的輪廓與深度結構。
An interference measuring apparatus comprises a light source module, a beam splitter, a first lens module, a reflecting module, a second lens module, and a detection device. A light beam generated from the light source module can be projected on the beam splitter. The beam splitter splits the light beam to generate a first light beam and a second light beam. The first light beam passes through the first lens module and then projects onto the reflecting module, and the second light beam passes through the second lens module and projects onto an object. Furthermore, the first light beam and the second light beam are reflected by the reflecting module and the object, respectively, then both the first light beam and the second light beam are leaded to the detection device to form an interference pattern for obtaining the contours and internal cross-sectional image of the object.
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| 專利簡述 / Intellectual Properties： |
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聯繫方式 / Contact： |
| 臺大產學合作總中心 / Center of Industry-Academia Collaboration, NTU |
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| Email：ordiac@ntu.edu.tw |
電話/Tel：02-3366-9945 |
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專利行銷平台