工程科學及海洋工程學系 - 蔡坤諭
	專業技術：奈米微影製程設備與軟體技術，奈米積體電路可製造性與抗變異性設計，奈米尺度偵測與控制系統，多準則強健最佳控制，系統識別，凸最佳化及其工程應用

研究介紹

◎專利

Kuen-Yu Tsai* (Stanford University), “Method for fast design of multi-objective frequency-shaping equalizers,” US Patent 6,992,542 B2, Jan. 2006
Kuen-Yu Tsai*, Sheng-Yung Chen, Hoi-Tou Ng, and Shiau-Yi Ma (National Taiwan University), “Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Chun-Hung Liu, Chooi-Wan Ng, and Pei-Lin Tien (National Taiwan University), “Method for Compensating Proximity Effect of Particle Beam Lithography Process (粒子束微影程序鄰近效應之補償方法),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Meng-Fu You, and Yi-Chang Lu (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Determining Proximity Effect Parameters for Non-Rectangular Semiconductor Structures,” USA (pending)
Kuen-Yu Tsai*, Wei-Jhih Hsieh, and Bo-Sen Chang (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Method for Improving Accuracy of Parasitics Extraction Considering Sub-Wavelength Lithography Effects,” USA (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen, Jia-Yush Yen, Yung-Yaw Chen, Chi-Hsiang Fan (National Taiwan University), “System and Method for Estimating Change of Status of Particle Beams,” USA (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same,” USA (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Apparatus and Method for Estimating Change of Status of Particle Beams,” USA (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen, Jia-Yush Yen, Yung-Yaw Chen, Chi-Hsiang Fan (National Taiwan University), “System and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變監測系統及其方法),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Apparatus and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變之估測裝置及其方法),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Chun-Hung Liu, Chooi-Wan Ng, and Pei-Lin Tien (National Taiwan University), “Method for compensating proximity effects of particle beam lithography processes,” USA (pending)

專利授權區

基於圖案製作真確度之圖案製作系統設計方法與裝置

一種直接考慮圖案製作真確度之圖案製作系統的設計方法。依據一組設計參數模擬目標圖案的製作結果以得到一模...... more

據模式製程鄰近效應修正方法與裝置

A method for compensating an effect of a patternin...... more

包含粒子束狀態監測子系統之粒子束圖案製作系統

本發明揭露一種調整一或多道粒子束狀態之系統,該系統包含多個粒子感測器、一估測單元以及一控制器,其中一...... more

以電子束微影進行高速大面積高解析度連續圖形的曝寫方法

一種電子束微影方法、電子束微影伺服控制方法及系統。依該電子束微影方法，係首先設定各子圖形的曝寫位置並...... more

粒子束微影鄰近應修正方法

A method for compensating proximity effe...... more

柱狀表面多層膜反射鏡