工程科學及海洋工程學系 - 蔡坤諭

專業技術:
奈米微影製程設備與軟體技術,奈米積體電路可製造性與抗變異性設計,奈米尺度偵測與控制系統,多準則強健最佳控制,系統識別,凸最佳化及其工程應用


研究介紹
  ◎專利
  Kuen-Yu Tsai* (Stanford University), “Method for fast design of multi-objective frequency-shaping equalizers,” US Patent 6,992,542 B2, Jan. 2006
Kuen-Yu Tsai*, Sheng-Yung Chen, Hoi-Tou Ng, and Shiau-Yi Ma (National Taiwan University), “Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Chun-Hung Liu, Chooi-Wan Ng, and Pei-Lin Tien (National Taiwan University), “Method for Compensating Proximity Effect of Particle Beam Lithography Process (粒子束微影程序鄰近效應之補償方法),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Meng-Fu You, and Yi-Chang Lu (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Determining Proximity Effect Parameters for Non-Rectangular Semiconductor Structures,” USA (pending)
Kuen-Yu Tsai*, Wei-Jhih Hsieh, and Bo-Sen Chang (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Method for Improving Accuracy of Parasitics Extraction Considering Sub-Wavelength Lithography Effects,” USA (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen, Jia-Yush Yen, Yung-Yaw Chen, Chi-Hsiang Fan (National Taiwan University), “System and Method for Estimating Change of Status of Particle Beams,” USA (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same,” USA (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Apparatus and Method for Estimating Change of Status of Particle Beams,” USA (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen, Jia-Yush Yen, Yung-Yaw Chen, Chi-Hsiang Fan (National Taiwan University), “System and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變監測系統及其方法),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Apparatus and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變之估測裝置及其方法),” ROC (Taiwan) (pending)
Kuen-Yu Tsai*, Chun-Hung Liu, Chooi-Wan Ng, and Pei-Lin Tien (National Taiwan University), “Method for compensating proximity effects of particle beam lithography processes,” USA (pending)
   
   
專利授權區
Design and optimization of an electron-optical system with a ball-tip emission source for multiple-electron-beam-direct-writw lithograph


...... more


以電子束微影進行高速大面積高解析度連續圖形的曝寫方法


一種電子束微影方法、電子束微影伺服控制方法及系統。依該電子束微影方法,係首先設定各子圖形的曝寫位置並...... more


次世代平行化無光罩微影系統架構與二維電子束位置監測系統架構於多電子束直寫微影系統


...... more


考慮臨近效應之寫入參數最佳化之相關係數要求


...... more


粒子束微影鄰近應修正方法




A method for compensating proximity effe...... more


曝光系統


本發明有關於一種電子束產生裝置,主要包括有複數個電子束元件,其中各個電子束元件由複數個電子束產生單元...... more


粒子束狀態估測方法與裝置


本發明揭露一種估測一或多道粒子束狀態改變之裝置,該裝置包含多個粒子感測器以及一估測單元,其中一或多道...... more


粒子束狀態監測系統


本發明提供一種一或多道粒子束的狀態改變監測系統,其包括複數個粒子感測器及一監測單元,其中一或多道粒子...... more


光學系統可製造性判斷之分析方法與裝置


A method of manufacturing an optical system is des...... more


據模式製程鄰近效應修正方法與裝置


A method for compensating an effect of a patternin...... more


包含粒子束狀態監測子系統之粒子束圖案製作系統


本發明揭露一種調整一或多道粒子束狀態之系統,該系統包含多個粒子感測器、一估測單元以及一控制器,其中一...... more


基於圖案製作真確度之圖案製作系統設計方法與裝置


一種直接考慮圖案製作真確度之圖案製作系統的設計方法。依據一組設計參數模擬目標圖案的製作結果以得到一模...... more


對於極紫外光具有高反射率與低熱吸收之孔隙結晶面鏡


...... more


   
   
可交易技術
曝光系統 半導體製程