|
 鄰氨基苯甲酸衍生物做為基質輔助雷射脫附游離法的基質應用在質譜分析
|
刊登日期：2021/03/04 |
 |
|
|
|
|
| ‧ 專利名稱 |
鄰氨基苯甲酸衍生物做為基質輔助雷射脫附游離法的基質應用在質譜分析 |
| ‧ 專利證書號 |
US 11,508,566 B2
|
| ‧ 專利權人 |
國立臺灣大學 |
‧ 專利國家
(申請日) |
美國 (2019/09/03)
美國 (2020/09/03)
|
|
|
| |
| ‧ 發明人/PI |
徐丞志,周必泰,李竹平,黃鵬軒,林立恩,黃俊穎,林大鈞,
|
| ‧ 單位 |
化學系
|
| ‧ 簡歷/Experience |
|
|
| 技術摘要 / Our Technology： |
A use of an anthranilic acid derivative as a matrix for a MALDI Mass spectrometry, comprising:
preparing a matrix compound represented by the following formula:
wherein X is selected from hydrogen and a hydroxyl group, and Y is selected from hydrogen, a methyl group or an acetyl group, provided that when X is hydrogen, Y is hydrogen or an acetyl group, and when X is a hydroxyl group, Y is a methyl group;
applying the matrix compound and an analyte onto a sample holder; and
analyzing the analyte by the MALDI mass spectrometer.
|
| 專利簡述 / Intellectual Properties： |
|
| |
聯繫方式 / Contact： |
| 臺大產學合作總中心 / Center of Industry-Academia Collaboration, NTU |
|
| Email：ordiac@ntu.edu.tw |
電話/Tel：02-3366-9945 |
|
|
| |
|
| |
 |
專利行銷平台